Project name «Horizon 2020»:
ERA-NET on Materials (including Materials for Energy) NMP-14-2015;
Materials for severe operating conditions, including added-value functionalities NMP-19-2015 (2 stage)
Person:
Professor V.V. Kondratenko
Key words:
EUV, X-ray, multilayer, radiation resistance, stability
Abstract
The main reasons of XMM radiation damage are layer interaction followed by change of periodicity; diffusional mixing; and crystallization/re-crystallization of layers. To solve these problems both thermodynamic and kinetic approaches in XMM design will be used along with optimization of their architecture.
Description of project idea:
We plan to use the following approaches to increase the radiation resistivity of XEUV multilayer mirrors:
· selection of materials which are inactive thermodynamically to one another (for instance, by selecting the material pair MoSi2/Si instead of Mo/Si, or Mo2B5/B4C instead of Mo/B4C etc.);
· retardation of interlayer mixing by introducing barrier layers of optimal thickness at interfaces (carbides, borides, silicides etc.);
· reduction of specific load by application of low absorbing materials (for example, carbon instead of molybdenum in Mo/Si XMM);
· increase of heat conductivity by selection heat-conducting materials and special heat treatment.
Scientific novelty
At present there were appeared a number of powerful XEUV pulsed sources (XFEL, X-ray laser, High Harmonic Generator, X-ray plasma source etc.) which can be used as an instrument in study of different processes within a matter. Production of radiation resistant XEUV optics will allow developing new kind of instruments to study and control high-speed processes.
List of publications:
1. M. E. Grisham, G. Vaschenko, C. S. Menoni, L. Juha, M. Bittner, Yu. P. Pershyn, V. V. Kondratenko, E. N. Zubarev, A. V. Vinogradov, I. A. Artioukov and J. J. Rocca, Book “Laser Ablation and its Applications”, Vol. 129/2007, Ch. 21, Materials Modification with Intense Extreme Ultraviolet Pulses from a Compact Laser, Springer Series in Optical Sciences, p. 529-548 (2007).
2. Yu.P. Pershyn, E.N. Zubarev, D.L. Voronov, V.A. Sevryukova, V.V. Kondratenko, G. Vaschenko, M. Grisham, C.S. Menoni, J.J. Rocca, I.A. Artioukov, Y. A. Uspenskii, A.V. Vinogradov, Mechanisms of radiation damage to Sc/Si multilayer mirrors under EUV laser irradiation, J. Phys. D: Appl. Phys., Vol. 42, 125407 (2009).
3. Y.P Pershyn, E.N. Zubarev, V.V. Kondratenko, V.A. Sevryukova, S.V. Kurbatova, Reactive diffusion in Sc/Si multilayer X-ray mirrors with CrB2 barrier layers, Applied Phys. A, Vol. 103, p.1021–1031 (2011).
4. E.N. Zubarev, V.V. Kondratenko, Yu.P. Pershyn and V.A. Sevryukova, Growth and crystallization of molybdenum layers on amorphous silicon, Thin Solid Films 520, p. 314-319 (2011).
5. Yuriy P. Pershyn, Eric M. Gullikson, Valeriy V. Kondratenko, Valentine V. Mamon, Svetlana A. Reutskaya, Dmitriy L. Voronov, Evgeniy N. Zubarev, Igor A. Artyukov, Alexander Vladimirovich Vinogradov, Effect of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers, Opt. Eng., 52(9), 095104 (2013).
6. Brewer C.A., Brizuela F., Wachulak P., Martz D.H., Chao W., Anderson E.H., Attwood D.T., Vinogradov A.V., Artyukov I.A., Kondratenko V.V., Marconi M. C. , Rocca J.J., Menoni C. S., Single-shot extreme ultraviolet laser imaging of nanostructures with wavelength resolution, Optics Letters, Vol. 33, No. 5, p. 518-520 (2008).
7. I. Artyukov, Y. Bugayev, O. Devizenko, V. Kondratenko, E. Gullikson, and A. Vinogradov, X-ray Schwarzschild objective for the carbon window (lambda ~ 4.5 nm), Optics Letters., Vol. 34, №11, p. 2930-2932 (2009).
8. I. A. Artyukov, A. V. Vinogradov , Ye. A. Bugayev , A. Yu. Devizenko, and Yu.S. Kasyanov, Soft X Ray Microscopy in the Spectral Region of “Carbon Window” with the Use of Multilayer Optics and a Laser Plasma Source, Journal of Experimental and Theoretical Physics, Vol. 109, No. 5, p. 872–884 (2009).
9. I.A. Artyukov, R. M. Feshchenko, A. V. Vinogradov , Ye. A. Bugayev , A. Yu. Devizenko, V.V. Kondratenko, Yu.S. Kasyanov, T. Hatano, M. Yamamoto, S.V. Saveliev, Soft X-ray imaging of thick carbon-based materials using the normal incidence multilayer optics, Micron, Vol. 41, p.722-728 (2010).
10. I.A. Kopylets, E.N. Zubarev, .L. Voronov, E.M. Gullikson, E.A. Vishnyakov, E.N. Ragozin, Fabrication and characterization of Sb/B4C multilayer mirrors for soft X-rays, Applied Surface Science, Vol. 307, p. 360-364 (2014).
Expected results:
A model of XMM degradation under XEUV irradiation will be built; an hierarchy of degradation mechanisms will be established; suggestions for constructing radiation stable XMMs will be given; XEUV of enhances resistivity will be produced.
Contact information:
Prof. V.V. Kondratenko
Address: X-ray Optics Group
Metal and Semiconductor Physics Department
National Technical University “Kharkiv Polytechnic University”
Frunze Street 21
Kharkiv 61002
Ukraine
Tel.: +38 057 751 04 70
E-mail: kondratenko@kpi.kharkov.ua
Website: http://www.kpi.kharkov.ua/en/
Expected partners:
Rolf A. Loch, Eric Louis, Fred Bijkerk, FOM Institute DIFFER (Netherlands)
Libor Juha, Jaromir Chalupsky, Institute of Physics of the ASCR, v.v.i. (CzechRepublic)
Ryszard Sobierajski, Institute of Physics (Poland)
Sasa Bajt, Deutsches Elektronen-Synchrotron (Germany)
Franck Delmotte, Institut d’Optique, Laboratoire Charles Fabry, Groupe Optique XUV Centre universitaire, Orsay, (France)